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HP0-J39 Designing and Implementation HP P4000(R) SAN Solutions

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HP0-J39 exam Dumps Source : Designing and Implementation HP P4000(R) SAN Solutions

Test Code : HP0-J39
Test denomination : Designing and Implementation HP P4000(R) SAN Solutions
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real questions : 145 real Questions

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HP Designing and Implementation HP

Randomised reviews of health programmes: from design to implementation | real Questions and Pass4sure dumps

This suggestions is for the 2018/19 session.

Dr Mylene Lagarde COW 3.02

This route is attainable on the MSc in global fitness policy, MSc in health policy, Planning and Financing, MSc in overseas health coverage and MSc in exotic fitness coverage (health Economics). This route is attainable with leave as an outside alternative to students on other programmes where rules allow.

Randomized trials absorb lengthy been used within the clinical world to examine the efficacy of medical treatments. currently, companionable scientists absorb barnone started using the identical approach, using random stint to confiscate components or assign in favor a coverage intervention otherwise to distinctive businesses, in an endeavor to investigate the causal consequences of the coverage of hobby. The recognition of randomized critiques has grown above all, however not solely, amongst researchers and policymakers in low- and center-salary settings.

Conducting a a success randomized contrast involves many inter-linked steps and a expedient realizing of a pair of statistical ideas. Randomized reviews likewise usually require to design and organise the facts collection of significant and constructive information, which comprises a number of crucial steps to evade pitfalls.  it's for this intuition elementary to maintain in sarcasm these different steps to design and enforce randomised evaluations accurately, or to subsist capable of severely analyse them.

This path proposes a fingers-on and intuitive manner to designing and conducting a randomised contrast. within the first half of the path, they are able to focus on causes for engaging in randomised evaluations; the passage to design the randomise test to gain positive it answers the question(s) of pastime (including considerations of statistical punch and pattern size calculation); how to deal with threats to randomisation. in the 2d half of the direction, they can talk about useful concerns raised by using fundamental data assortment, together with a passage to most useful measure results of activity; a passage to design first rate outfit and how to habits and control fieldwork.

Seminars may subsist designed to hearten students to severely engage with the issues and observe the technical competencies taught. each and every seminar might subsist carefully aligned with the lecture content to supply students the chance to apply the brand unusual capabilities. Case stories might subsist chosen from numerous cultural backgrounds, to enable the presentation of a diverse latitude of settings and concerns.

15 hours of lectures and 15 hours of seminars in the LT.

A draft protocol. students will subsist requested to assign up a short 1,500 subsist cognizant draft protocol via week eight. whereas some facets of their toil can likewise nevertheless subsist toil in progress (e.g. using bullet features), students might subsist expected to assign in writing up the first half of their protocol in a more designated manner. The outlines might subsist graded and remarks given to students. This permits college students to bag profitable event of writing at MSc stage at LSE, and they will likewise subsist cognizant more notably the expectations of the summative assessment. students might subsist capable of employ this feedback of their writing of the summative work.

research inspiration (one hundred%) in the LT.

The point of the research protocol (four,000 words max) could subsist to draw the randomised evaluation of a specific fitness programme. college students might subsist asked to opt for one programme from a proposed checklist. they're going to likewise subsist given the option to select their own intervention (pending agreement by means of their seminar leader).

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HP's subsequent-gen home windows blended fact headset will game a brand unusual design and excessive-res displays | real Questions and Pass4sure dumps

Microsoft confirmed off the first consumer windows blended fact head-established displays (HMDs) from companions corresponding to Acer, Dell, HP, and Lenovo lower back in October 2017 at an adventure in San Francisco. The devices launched alongside the windows 10 Fall Creators update, with expenditures starting at $299. The HMDs came with different designs, however equivalent standards comparable to a 1440X1440 resolution monitor, and framerates of 60fps for PCs with integrated snap shots and 90fps for methods with discrete photos.

whereas not an dreadful lot in the approach of a refresh to a lot of these devices took place, Samsung launched its second-generation HMD, the Odyssey+ in October 2018, with advancements to necessities and the design of the gadget. soon, one other unusual headset may subsist on the way, as HP is likewise readying it subsequent-era HMD, as per the folks at RoadtoVR who acquired an unique preview of the unannounced windows blended reality headset, codenamed ‘Copper’.

The document states that HP is re-designing its HMD from the ground up, and from the looks of it, it does explore enjoy a significant update. The machine now activities an Oculus Rift-like design with the top straps going in the course of the facets and above the pinnacle, assembly at a round structure at the returned. The gadget is additionally expected to comprise a heathered fabric on the front where the cameras for monitoring are located. The headset is declared to subsist lighter, making it greater at ease to wear, and it'll additionally feature stronger mechanicals to gain it easier to placed on and lift away.

As for specs, the next-generation machine will present a 2160X2160 resolution screen per eye, making it the most pixel-dense pomp in a mixed fact Headset yet. In evaluation, Samsung’s unusual Odyssey+ activities a 1440X1600 resolution expose per eye. most likely, the denser expose makes for crisp, clear images, bringing much-essential advancements to the event. The denser screen likewise helps mask the screen door consequence (the impact caused by means of the unlit areas between any two pixels), negating the want for additional accessories just enjoy the diffuser on Samsung’s Odyssey+.

HP states that the improvements to the HMD came from its traffic valued clientele and that the consumers didn’t believe the container of view a gigantic enviornment of concern as a stately deal as the resolution and comfort. The company is planning on bringing this headset to its device as a service for VR providing as a portion of the Z through HP brand.

while HP didn't demonstrate particulars concerning the launch date or pricing, the enterprise did confirm that it may subsist promoting the outfit to each, organisations and buyers. windows combined veracity has been receiving improvements in the latest test builds for the subsequent essential home windows 10 replace, which may virtually actually subsist referred to as the home windows 10 April 2019 replace. The platform has additionally begun seeing multiplied relevance in gaming, so it should subsist enjoyable to peer how smartly ‘Copper’ will subsist acquired, and if the improvements inspire extra clients to trust it.

supply: RoadtoVR by the employ of Thurrott

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Designing and Implementation HP P4000(R) SAN Solutions

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SAP System Landscape Design and Planning Approaches | real questions and Pass4sure dumps

This chapter is from the reserve 

Remember, a system landscape exists for each mySAP solution—if you deploy R/3, APO, CRM, and PLM, you will in consequence subsist creating four different SAP system landscapes, one for each product. The focus in this and the following few sections, though, is on what one of these system landscapes looks enjoy from a design and planning perspective, for instance R/3 lonesome or APO alone.

In the most common form, an SAP system landscape consists of SAP instances (installations of the SAP database and application software) and SAP servers. In the Microsoft world of SAP implementations, there is a one-to-one correlation between instances and servers nearly barnone the time. That is, the development instance resides on a dedicated development server, the Test instance resides on a dedicated Test server, and so on. In the world of UNIX implementations, though, multiple instances can subsist often found on a single "larger" server. For example, both development and Test instances can reside on a single server. And multiple application instances can subsist installed on a single server as well.

Until last year's release of SAP's Multiple Components, One Database (MCOD) initiative, there was a one-to-one correlation between instances and database systems, too, regardless of the Operating System platform. MCOD is birth to change this, such that a single "larger" database can subsist leveraged for multiple instances. However, an notable disagreement between MCOD and multiple instances/one server exists—MCOD ties the same character of databases within different SAP system landscapes together. With MCOD, barnone development databases used by your R/3, SRM, CRM, and Workplace implementations can subsist one and the same. Similarly, barnone Test databases across R/3, SRM, CRM, and Workplace can subsist bundled together, too, as illustrated in figure 3.3. Note, however, that in many cases SAP AG frowns on mixing OLTP and OLAP systems, or combining different databases within the same system landscape. In that regard, forcing an MCOD database server to host your R/3 system's development and Test databases would therefore subsist unsupported and perverse to best practices.

Figure 3.3Figure 3.3 A properly architected sample MCOD deployment is displayed for a typical mySAP enterprise consisting of R/3, CRM, SRM, and Workplace.

As they toddle forward with their basic understanding of SAP system landscapes, and quest to understand how your SAP solution vision impacts and is impacted by your landscape decisions, my hope is to achieve the following:

  • Note the relative weight and relationship of technology perspectives to their solution vision

  • Understand why each system landscape is notable to fulfilling their vision

  • Note how the presence or absence of a particular system within a landscape impacts the other systems and ultimately the overall solution vision

  • All these design and planning approaches I cover tend to approach into play in one manner or another across barnone mySAP implementations. It's how they are weighted or addressed that makes one system landscape different from the next.

    Simplifying Your SAP System Landscape

    After spending time with hundreds of customers and SAP implementations, I assume it is safe to insist that when barnone things are equal, the want to simplify emerges as an notable driver. Simplification takes many forms, too. In the case of the SAP system landscape and how it fulfills their SAP solution vision, the want to simplify manifests itself in any number of ways:

  • First, the sheer number of instances will subsist reduced to the fewest necessary to bag the job done "right" for a particular company. An organization focused on simplifying administrative, change management, systems management, operations, and other tasks will deploy a three-system or even a two-system landscape, whereas similar organizations without the same simplification goals can deploy more. There are trade-offs, of course. A system landscape without a dedicated test instance will, for example, subsist forced to effect testing in the same system used for development. Because of these kinds of limitations, simplification achieved through instance reductions is not as common as it has been in the past.

  • Instead, a more accepted approach to simplification seeks to reduce the number of physical servers in a particular system landscape, by installing multiple instances on a single server. Consolidation of instances is becoming quite common in SAP customer environments today, as displayed in figure 3.4.

  • Figure 3.4Figure 3.4 Multiple SAP instances can subsist installed and configured on a single physical server, oftentimes reducing both acquisition and systems management costs down the road.

  • Similarly, deploying a shared disk subsystem and tape backup/restore solution likewise simplifies a very complicated piece of the SAP Solution Stack. This is why my colleagues and I absorb spent so much time in the last two years designing and implementing Storage district Networks, or SANs—they provide outstanding performance while simultaneously reducing system landscape complexity and allowing expensive resources enjoy enterprise tape libraries to subsist shared between systems.

  • Another customer of mine shared with me why they went with the WebGUI as opposed to the classic SAPGUI approach to system accessibility—to simplify desktop support and maintenance requirements.

  • Companies that value simplification will likewise standardize on a particular solution stack option or approach, too, as this simplifies support and maintenance, and minimizes the requisite for a variety of onsite/reserved spare parts, the time spent in change management activities, and more.

  • Although simplification tends to toil in one direction by encouraging a "do more with less" philosophy, their next topic goes the other route in that it purposefully introduces complexity and differences between various systems within a system landscape—high availability.

    High Availability and the SAP System Landscape

    When it comes to tall availability, many technology professionals automatically assume about what it means to better the availability of a particular system or hardware component—thoughts of basic HA offerings enjoy clustering or redundancy approach to mind. With esteem to the broader topic of how your solution vision impacts your SAP system landscape, though, tall availability equates to the following:

  • Business-driven requirements—HA offerings and approaches are normally implemented to satisfy specific business-oriented needs, and therefore contour an integral portion of your overall SAP solution vision.

  • Complexity—HA complicates the SAP system landscape, as HA offerings and approaches tend to only really exist or apply to the Production system and at minimum (hopefully!) another similarly configured system within the landscape.

  • Increased support needs—Because HA offerings are inherently complex, a very real requisite exists to prepare your SAP support organization in how to install it, update it, manage it, and troubleshoot HA issues.

  • To read more about how traffic requirements relate to tall availability, remark "Availability Planning—Documenting Requirements and Key Drivers," p. 167 in Chapter 6.

    Disaster Recovery Considerations

    All companies implement a manner of addressing disaster Recovery (DR), whether or not they actually realize it. Even companies that finish not add a dedicated DR system to their system landscape address disaster recovery. That is, their de facto disaster recovery draw simply reflects the challenges and timeframes surrounding rebuilding their SAP system from scratch, restoring from their latest tape backup, and imposing upon their cease users to manually rekey any unusual traffic transactions lost between the last successful tape backup and the point at which the disaster occurred. This doesn't sound enjoy much of a "plan," of course, but it does limn a baseline against which barnone other disaster recovery approaches and solutions can subsist weighed.

    A host of DR approaches are discussed throughout Chapter 6, from those involving disk subsystem data replication solutions, to various clustering solutions, to database and mySAP-specific tactics. But when it comes to sifting the potential layout of your SAP system landscape through your solution vision, two common approaches Fall out:

    Both approaches are valid, and the first is more traditional. But I believe that the time and expense related to setting up, configuring, keeping current, and managing your own DR system explains the recent increase in outsourcing I've seen over the last two years.

    To review some of the tasks and considerations inherent to addressing DR internally as opposed to outsourcing it, remark "SAP common Availability and DR Best Practices," p. 207 in Chapter 6.

    Companies that outsource the DR component of their SAP system landscape abet to preserve their data, and access to this data, in that the outsourcer operates a completely independent data center, typically in a very different geographic location. For smaller and mid-size companies with only a single data center, the expense relief is tremendous. On the other hand, if the DR solution is maintained "in-house," so to speak, it will requisite to subsist housed in a divide facility. This lonesome is positive to drive complexity, cost, and even the architecture and makeup of both the SAP system landscape and its individual systems.

    Addressing Training Requirements

    The SAP system landscape is directly impacted by the potential requisite to train SAP cease users as well as the system's developers and technical support staff. Three different systems approach into play, as illustrated in figure 3.5:

  • A dedicated Training system is often implemented to assist in teaching users unusual to a particular mySAP component how to actually employ the system. This amounts to business-process training as well as SAP user interface training (an excellent alternative to creating multiple training clients on the Test system, which is assiduous fulfilling integration responsibilities prior to Go-Live—the exact time when cease users requisite to subsist trained!). To provide the most value to its students, the Training system needs to subsist an exact copy of Production.

  • A dedicated Technical Sandbox system is extremely useful in helping the SAP Technical support Organization (SAP TSO) bag up to speed on the entire SAP Solution Stack, especially with esteem to unusual components and complicated HA offerings (rather than attempting to bag time on other systems for what could amount to crash-and-burn testing).

  • A dedicated traffic Sandbox or development Sandbox system allows developers unfamiliar with a particular mySAP component, or faced with integrating multiple components and other legacy systems, the chance to finish so in a sheer testing environment (rather than the real development system).

  • Figure 3.5Figure 3.5 These SAP training systems support the different needs of different organizations, from cease users, to developers and programmers, to technical implementation specialists.

    For details as to how the SAP system landscape satisfies the training needs of both the SAP Technical support Organization and the production system's cease users, remark "Training and the Role of the SAP System Landscape," p. 314 in Chapter 9.

    It can limn quite a challenge for the "customers" of one of these training systems to convince everyone that such a system is truly required. In my own experience, I absorb seen the lack of a Technical Sandbox really rack an organization in terms of downtime due to botched infrastructure upgrades and changes to DR processes.

    Another colleague of mine has more than once had to strongly propel for the adoption of a Training system, too. Such a system allows for extensive informal user testing and practice outside of formally delivered training. He believes that this extra level of hands-on self-directed training is critical because your end-user community is best positioned of barnone groups to find business-process operational errors and limitations. And of course it is desirable to remedy these issues well before Go-Live. But a consultant or even a senior super user is typically not positioned to propel the adoption and employ of a dedicated Training system. More often than not, it takes the SAP Steering Committee, the project's experienced management team, and the prodding of a knowledgeable SAP Solution Architect to finish so. I cannot stress this enough—the risk is huge, in that you finish not want to find out too late that not every traffic scenario works as it did during integration testing (for example, barnone types of contracts, barnone types of material movements, barnone kinds of accounting entries, and so on).

    The Performance-Driven System Landscape

    When it comes to evaluating your solution vision against the layout of your SAP system landscape, it is notable to ensure that the performance of the systems meets the needs of their different end-user communities. Most of the time, of course, the focus is on designing, installing, and configuring a well-performing Production system. Performance considerations usually relate back to what an cease user will undergo while on the system, including

  • Business transaction response times, or how long it takes to refresh your SAPGUI after pressing the Enter key, for example.

  • How quickly a background or "batch" job will execute, otherwise known as throughput.

  • How quickly a report or other query will gain it through the system and actually subsist printed, sometimes called latency.

  • To read more about verifying that a Production system can meet performance expectations, remark "Key SAP Stress-Testing Considerations," p. 580 in Chapter 16.

    However, these same performance considerations apply to barnone of the other systems within the SAP system landscape, too. The development system, for example, needs to exhibit excellent performance even while 25 or 50 or more developers are banging away at keyboards trying to build your custom mySAP solution. Similarly, your Test system needs to provide the performance necessary to bag through integration testing. Even the Training system needs to provide adequate user response times so as to gain the actual training undergo more than something to subsist avoided.

    High-performance considerations cover the gamut, touching every facet of every system within the landscape. This means that everything—from the performance of the network connecting each system, to each server's CPU, RAM, and disk configuration, to each system's OS, database, and mySAP component—must subsist addressed. Starting off on the perquisite foot (with properly sized and configured hardware and software elements) is paramount, of course, but tuning barnone these solution stack pieces to create a cohesive well-running machine is just as notable to achieving excellent performance. enjoy the weakest link in a chain, a single underperforming solution component will only throttle back the maximum performance otherwise obtainable from your system.

    Driving Scalability into Your System Landscape

    The requisite for scalability, enjoy tall availability and excellent performance, is addressed primarily through the sizing process. Scalability does not pay off up front in terms of improved system availability or better user response times, though. Rather, scalability is barnone about paying for "headroom" in your system, headroom that is not actually needed at present but might subsist required in the near future. In other words, scalability addresses future planned and unplanned growth in your system.

    This growth can manifest itself in a number of ways. In my undergo in the real world, I absorb seen the results of unplanned growth rack companies where scalability was never addressed, as in the following cases:

  • The number of cease users increased at one of my unusual accounts, not due to more hiring than was anticipated when their solution was crafted, but because they unexpectedly acquired their competitor and doubled in size. They had six months to project the delta needed in terms of database and application server processing power and RAM requirements, followed by stress-testing the unusual design and finally implementing it.

  • More than one of my customers' databases grew so lickety-split that they outstripped the results of their comprehensive three-year database sizing methodology in the first year! In most cases, the system they assign in plot for these customers was scalable—more disk drives could subsist added, smaller drives could subsist swapped with larger ones, and so on. In three cases in particular, though, the database growth was so explosive that a gross unusual disk subsystem platform needed to subsist brought in, and the recently acquired current platform retired (or redeployed) years earlier than expected.

  • When databases grow quickly, the tape backup/restore solution implemented often grows less effectual as well. I absorb seen this most often in relatively wee SAP implementations, where an initial investment in tape backup technology needed to subsist tossed in favor of tape solutions that backed up more data per tape cartridge, and did so lickety-split enough to not exceed the customer's backup window (time allotted to effect a backup, which usually equates to planned downtime in the case of offline complete backups).

  • It's been a while, but I likewise had a customer outgrow their network, too. Today, with switched networks and Gigabit Ethernet providing more than adequate bandwidth to every server component, and cheap 10- and 100-Megabit Ethernet prevalent across end-user workstations, there's no excuse for lacking network scalability.

  • Outstripping the capabilities of your current system such that a unusual platform is needed probably represents a worst-case scenario. Not only does the current Production component requisite to subsist replaced, but to support sound change control principles, so does the same component in your Test, Staging, and/or Technical Sandbox environments.

    This is why hardware and software vendors tout things enjoy "highly scalable system architectures," "enterprise versions" of particular Operating Systems and Database Systems, and so on—though not necessarily needed up front, the headroom that these approaches provide helps an organization feel more cozy if they wind up growing faster than they expected. And hardware vendors in particular can position their SAP clients for improved scalability by practicing the following:

  • Specify server platforms that allow additional CPUs and RAM to subsist added as needed. In other words, avoid "maxing out" the box.

  • Alternatively, design SAP solutions such that they lift advantage of SAP's support for horizontal scalability. This is one of my favorite approaches when it comes to SAP Application, Web AS, J2EE middleware, and ITS servers—I prefer to max them out with esteem to processors, with the understanding that an incremental number of servers can subsist added at any time should the environment grow to require it (interestingly, although SAP has successfully tested a system running more than 160 application servers, it is rare to find customer implementations with more than 10 or 12).

  • Architect a solution for the confiscate level of plumb scalability. In other words, if a two-tier "Central System" (where barnone SAP software components execute on the same physical server) approach to sizing meets today's requirements, perhaps a three-tier solution will provide for unknown scalability requirements. In a three-tiered architecture, one database server and multiple application servers are configured as a single system image.

  • Architect a highly scalable database platform. As my real-world examples earlier in this list illustrate, this tends to subsist where a lack of scalability causes the most problems.

  • Hardware and software vendors alike expend a stately deal of time "proving" how scalable their offerings are. As a first step, I imply that benchmarks, customer references/feedback, and the results of tests published through white papers and other technical documents subsist reviewed by prospective mySAP customers. I likewise imply that you commence considering unusual approaches to scalability. For example, HP's iCOD offering touts "capacity on demand." When a customer buys a server, for instance, it is fully populated with CPUs. The customer pays for only what is needed in the near term, however. Later, if it is determined that more processing power is required, the customer takes advantage of the in-place processors by merely applying for a license; no intrusive bailiwick upgrade or service muster is required and therefore the requisite for planned downtime is drastically reduced.

    The TCO-Driven System Landscape

    More than anything else, Total Cost of Ownership (TCO) drives what a solution vision actually looks enjoy at the cease of the day, when a mySAP solution is implemented and really being used. Discussions on TCO might instead subsist labeled revert on Investment (ROI), or might Fall under the heading of investment protection. Regardless, a focus on lowering TCO seeks to find less expensive solution-stack alternatives that silent meet the needs of the business.

    To read more about the relationship between TCO and your SAP solution vision, remark "How the SAP Solution Vision Drives TCO," p. 127 in Chapter 5.

    When barnone other things are equal, the following points apply from a hardware perspective:

  • A hardware vendor's employ of common components enjoy CPUs and recollection boards allows supple sharing of resources between different SAP system landscapes and in some cases hardware platforms, too.

  • Similarly, common disk drive contour factors reduce cost of ownership by increasing reusability.

  • Support for hot-pluggable and/or hot-add hardware components eliminates or worst-case minimizes downtime (can comprise arduous drives, tape drives, power supplies, fans, and even RAM and processors).

  • Support for redundant components, enjoy power supplies, disk drives, fans, and so on, likewise eliminates or minimizes downtime.

  • The faculty to escape mixed-speed CPUs or RAM in a particular platform protects that investment—CPUs and RAM finish not absorb to subsist tossed aside when additional processing power or recollection is required.

  • Outsourcing your entire SAP infrastructure/operations team is another potential manner of reducing TCO. In fact, outsourcing can limn the biggest potential TCO factor that a company will consider. At this level, though, outsourcing becomes more of a strategic traffic solution that impacts a lot more than simply TCO. True, outsourcing can cleave labor costs by 50%, and enhance flexibility of a technical support organization to easily change as traffic requirements change, but there are drawbacks and disadvantages as well (discussed later in this chapter).

    Another solution vision approach that impacts the SAP system landscape from both a configuration and TCO perspective is the employ of an Application Service Provider (ASP). ASPs can drive lower TCO by virtue of their application-specific expertise, above and beyond that provided by in-house staff and traditional outsourcing providers. For example:

  • An ASP can proffer a preconfigured solution stack for the particular mySAP solution you want to implement. This is one intuition why they explore so expedient from a TCO perspective—design, deployment, manageability, operations, and other cost factors are substantially reduced due to a tall level of both standardization and core competencies in the services they provide.

  • ASPs were more or less born out of the dot-com era, and by virtue of this, their data centers prize the benefit of corpulent redundant pipes to the Internet. Thus, applications are well positioned to lift advantage of this supple and powerful accessibility option.

  • ASPs proffer tantalizing financing alternatives, in that they colleague with various SAP technology partners to gain leasing, pay-as-you-go, and other payment methods available.

  • The ASP provider market shrank over the last few years. The mySAP-focused companies that weathered these arduous times appear even better prepared and well-positioned to host SAP solutions, however.

    Security Considerations

    I know of no company that does not envision protecting its corporate computing assets. From a solution-stack security perspective, not barnone software vendors are created equal, however. Oracle touts its unbreakable database, UNIX vendors tout the robust security features of their operating environments, and so on. In my eyes, security features are very important, but expedient security is more often about managing and testing changes to a solution stack, by carefully identifying security holes and other weaknesses in unusual solution stack components before these components ever find themselves in Production.

    However, companies that embrace and act upon the concept of protecting computing assets will prove to subsist better partners in the long run. This is why I believe that Oracle's focus on security will pay gigantic dividends in terms of slowing the adoption of competing databases. And it is why I believe that the Trusted PC joint Intel, AMD, and Microsoft vision (once labeled by Microsoft as Palladium, and now referred to as the "next-generation secure computing foundation for Windows") will prove fruitful as well. Its goal is to build security into servers and PCs at a microprocessor level. unusual initiatives coming out of the Trusted Computing Platform Alliance covenant to better secure their processing platforms, ensuring that only authorized applications and program executables can ever subsist executed by the system, and that barnone data housed on the system is encrypted so that it is useless to others. To this end, Microsoft considers Trusted PC a significant portion of its Trustworthy Computing strategy—we should remark something commercially available in this esteem by 2004 that applies to server as well as desktop and other computing platforms.

    Manageability Considerations

    No customers of mine absorb ever started their initial SAP implementation planning discussions with me by saying:

    "George, barnone that high-availability and performance stuff is fine, but what they really want is a nice manageable system. Can you finish that for us?"

    By the time Go-Live looms just over the horizon, though, every single one of them—without exception—has indicated a growing concern for manageability. Sure, it's there on the project plan, and any number of products can subsist used to support managing your mySAP environment. But the gross bailiwick of manageability is more complicated and more toil than you would imagine. reckon the following:

  • Each layer in the SAP Solution Stack must subsist managed; the risk of not keeping an eye on a particular layer or solution component affects the uptime of the entire system.

  • Because each layer is so different from the others, it's nearly impossible to find a single management product that can actually monitor and report on more than a few layers, much less the entire stack.

  • Therefore, the next best thing becomes trying to find a product that can at least interoperate successfully with other products.

  • At the cease of the day, three, four, or even more tools and utilities must ultimately subsist fused together to provide a holistic view of a mySAP solution stack. This is challenging, to insist the least!

  • To learn exactly how challenging piecing together a management approach can be, remark "Systems Management Techniques for SAP," p. 511 in Chapter 14.

    Because of the challenges inherent to managing hardware and software products from a lot of different solution stack vendors, some of my customers absorb purposely chosen less than "best-of-breed" products for their SAP solutions, so as to minimize the number of software partners involved. Or they absorb decided to reduce the number of partners and vendors altogether by selecting one of the gigantic enterprise hardware/services vendors. The obvious partners are clear—HP, IBM, and Sun. For example, if you proceed with HP and choose to implement an rp8400-based server platform with an HP StorageWorks SAN, running HP-UX 11i, and managed by HP OpenView, the challenges inherent to managing four different vendors' products just dropped tremendously. Similar arguments could subsist made for going with an IBM or Sun solution stack, too—IBM even throws a pair of databases into the mix.

    The System Landscape and Accessibility

    The last district I want to cover with esteem to solution vision and the SAP system landscape is accessibility. Many companies over the last three or four years absorb started with a vision of dumping barnone application-specific interfaces in favor of browser-enabled solutions, so as to ease the burdens and costs associated with desktop/laptop management while opening up unusual accessibility approaches enjoy hand-helds and other wireless devices. SAP has supported that vision since 1996, with the advent of Internet connectivity in R/3 3.1G. But only in the last few years absorb I really seen this lift off.

    SAP AG offers quite a few accessibility options today when it comes to mySAP solutions. The classic SAPGUI and its revamped and more capable EnjoySAP SAPGUI limn one cease of the spectrum. This approach is safe, very mainstream, and very simple to implement. And the SAPGUI they absorb today is extremely comprehensive, supporting barnone mySAP components through a single interface, which is unlike the approach a few years ago where each so-called "New Dimension" product enjoy BW or APO required its own GUI. But the SAPGUI silent represents a typical application-specific approach to accessibility; each cease user installs the client on their desktop or laptop, or runs the SAPGUI from a network share, and off they go.

    Other accessibility approaches are available, however, as you remark in figure 3.6. The original WebGUI, for example, is based on HTML and provides connectivity via Microsoft's Internet Explorer and so on. And a more recent addition, the JavaGUI, allows indigenous Java-based access to SAP. Both of these approaches fulfill an Internet-based approach to connectivity, and subsequently simplify the desktop (assuming Internet connectivity is a benchmark desktop offering at your particular company, of course).

    Figure 3.6Figure 3.6 Access to mySAP solutions is quite varied today, ranging from classic and updated SAPGUI options to newer Web-enabled versions.

    Onsite news | real questions and Pass4sure dumps

    On this page:

       Thursday 25 February   Wednesday 24 February   Tuesday 23 February   Monday 22 February

    The Photo Gallery highlights technical events, the Exhibition, and more.

    The Mock crucible Photo Gallery provides coverage of judges, wigs, and much more.

    SPIE Advanced Lithography Plenary

    Thursday 25 February 2010

    It’s back: Energy returns to lithographyIt was clear throughout SPIE Advanced Lithography that energy has returned to the lithography sector, agreed Symposium Chairs Christopher Progler and Donis Flagello. They praised the outstanding toil on the portion of conference chairs in organizing the programs, and the high-quality of content presented by the authors.

    The week was characterized by complete conference rooms, assiduous exhibit aisles, and networking that started over breakfast and continued long past dusk. Technical conference attendance was another indicator, coming in nearly one-third higher than last year. The final matter for total attendance for 2010 was 2,100.

    Standing-room-only conference rooms and high-energy networking continued through the final day, with the last sessions in five conferences, professional development courses, and award announcements topping off the week.

    Andrew Estroff,

    Rochester Institute of Technology, was given the Cymer-sponsored Best Student Paper in Optical Metrology Award for his paper on “Metamaterials for enhancement of DUV lithography.” Marshall Miller, Univ. California, Berkeley, won Honorary Mention for his paper on “Automatic numerical determination of lateral influence functions for lickety-split CAD.”

    Technical special events concluded with a panel discussion on reference metrology in the nanotechnology process. The panel was moderated by Vladmir Ukraintsev, and included six panelists from Asia, Europe, and North America representing industry, academia, research, and manufacturing perspectives. Held in the Metrology, Inspection, and Process Control conference, the panel was likewise a portion of the Global Collaboration in Reference Metrology working group meeting.

    Wednesday 24 February 2010

    Full rooms, assiduous aislesAll six conferences were in session on Wednesday, with many papers drawing packed audiences. Technical attendance is up more than 25% at this year’s SPIE Advanced Lithography, reflecting an optimistic trend throughout the industry.

    Technical special events included a panel sponsored by NIST on “Strategies for increasing the value of metrology and inspection,” and a well-attended poster session for conferences on EUV, Alternative Technologies, Optical Microlithography, and Design for Manufacturability through DPI. Moderators for the NIST panel were George Orji and Ronald Dixson.

    On Day Two in the exhibition hall, the aisles were complete of shoppers and customers,

    and exhibitors reported much deal making on the floor as well as at the numerous company events. “Based on AL and other indicators, 2010 looks better,” said Sara Eideh of Synopsys. “We are delighted with how expedient Advanced Lithography 2010 has been.” Eideh said turnout for her company was nearly 50% better than last year.

    Tuesday 23 February 2010

    Panel Discussions Address Nano and EUVSPIE Advanced Lithography continues to subsist the plot to find the perquisite people, according to Day One feedback from exhibitors, with the even traffic and sturdy energy on the exhibit floor providing more positive indicators of economic health. In the words of Wilma Koolen-Hermken, CEO of HamaTech,“It is obvious by the success of the meeting that the industry has begun to spin around."

    Others were enthusiastic as well. "Advanced Lithography is awesome, as always," said Ron Synowicki of J.A. Woollam, who was already pleased with the leads he had gotten only four hours into the show. "Nothing is better than face-to-face interaction with customers. We're seeing a stately amalgamate of academia and industry."

    “We were delighted that the attendees came in for afternoon coffee and stayed to talk business," said Patti Shaw of Brewer Science. "Leads are up over last year and the trait is good." Shaw said that Brewer doubled the number of staff they brought to Advanced Lithography this year, another indicator that traffic is on a up-swing.

    Conference rooms were assiduous throughout the day and at times standing-room-only, and a panel on metrology in the current economy closed the day for the Metrology, Inpsection, and Process Control conference.

    A Women in Optics luncheon presentation featured a talk by Anna Sidana of One Million Lights, an initiative to better education, personal income, health, and environmental trait in developing countries by replacing kerosene lamps with portable solar lighting.

    It was a assiduous evening as well, with approximately 1,000 attendees at the first of the week's two poster sessions, and a spirited "trial" pitting EUV against DPT.

    Mock crucible Examines vie TechnologiesOnly at SPIE Advanced Lithography in San Jose will you witness the world's top minds in the semiconductor industry donning black robes and white wigs and participating in a mock crucible (heavy on the "mock") to determine the feasibility of vie technologies for the 22-nm HP node and beyond.

    Like a scene from Inherit the Wind or To Kill a Mockingbird

    seen through psychedelic lenses, an overflowing courtroom brimming with standing observers rose to homage Judges Chris Progler of Photronics and Donis Flagello of Nikon as they entered the court. Representing EUVL were Obert Wood and Bruno La Fontaine of Global Foundries, and representing double patterning ArF were Will Conley of Freescale and Mircea Dusa of ASML.

    The judges encouraged the audience, who were serving as jury, to toddle to the side of the elbowroom they agreed with as the crucible progressed. This would prove difficult, as barnone seats and barnone standing elbowroom was well occupied with rapt observers. judge Flagello reiterated that this court observed no legal code other than Moore's Law, and as evidence of this, the jury was asked to stand and bow allegiance to a massive, projected image of Gordon Moore.

    Opening arguments began with the case for EUVL, argued by Wood, who asserted that "it's barnone about k1." Comparing EUV vs DPL 193i, he showed significant degradation in DPL vs EUVL at 40-nm HP, and claimed that 22-nm HP was simply not workable with double patterning, while Zeiss had optical designs already to extend EUVL to below 22 nm.

    Conley went on the attack in his opening arguments for double patterning, showing roadmaps of ArF pitch division vs EUV.

    As a first witness, Skip Miller of ASML presented his cost analysis for patterning options at 2x-nm HP, showing that single-exposure EUV displayed the lowest cost of barnone options.

    Tatsuhiko Higashiki of Toshiba showed the Toshiba roadmap for EUVL to extend the spacer process, declaring that a 2x-nm HP node process study will commence this year or next to address some primary challenge, such as defectively < 0.1/cm2 and throughput above 100 wph.

    Janice Golda then showed Intel's needs to ramp up manufacturing at the 22-nm node by 2015. For logic layouts, she said, one might requisite 4 or more masks. She likewise asserted that a microprocessor company enjoy Intel is much more sensitive to mask defectively than a recollection maker, so Intel was challenged to gain a zero-defect EUV reticle, which they did accomplish recently.

    Paul Ackmann from Global Foundries pointed out that the biggest issue is getting a unusual technology in plot as soon as possible, and EUV has an advantage in that it can backfill to earlier technologies , while DPL cannot.

    Nigel Ferrar of Cymer was asked whether EUVL could subsist powered without a nuclear power plant, a reference to char Lin's oft-quoted assertion that EUVL sources will absorb exorbitant power needs. Ferrar stated that needs will subsist ~3x what an ArF scanner requires today, and that a 350 W source that delivers 150 wph will subsist available in 2011.

    An energetic Conley then cross-examined the EUV team's witnesses on source power with a comedic figure of EUVL powered by the Hoover Dam, and plotted his estimation of EUV fab and utensil costs vs the GDPs of countries enjoy Tonga, Belize, and Latvia.

    The witnesses for DPL then took the stand, birth with Kevin Lucas of Synopsis, who showed multiple design rule and patterning options to extend into 22 nm and below.

    Kit Ausschnitt of IBM quoted Hamlet and displayed a very graphic animation of the "overlay elephant" that must subsist confronted to toddle to smaller nodes. He stated that overlay improvements will enable 193 nm DPL extension to 22 nm and beyond, but there will subsist no dearth of overlay challenges in either case. Certainly, he said, EUV is inevitable, but so is the imminent collapse of their sun. Possibly, he jabbed, EUVL will subsist ready by then.

    Andrew Hazelton of Nikon then pointed to Nikon's S620D shown in the Plenaries to demonstrate that DP is available today, and Patrick Wong of IMEC showed that for the 22 nm node, various solutions demonstrate covenant for different layers and applications.

    Wood's Perry-Masonesque cross-examination of the DPL witnesses focused on the cost issues and complexity of the many masks necessary. The DPL witnesses rebutted his math and stood their ground that overlay was not a problem for DPL.

    After closing arguments, judge Progler famed that the sheer number of observers serving as jurists made stirring to their favored side of the elbowroom impossible, so he called for applause to determine the trial's winner. With equal applause, Progler declared a hung jury and adjourned, hinting that a retrial will subsist needed next year.

    Many more photos are available in the Mock crucible Photo Gallery.

    Monday 22 February 2010

    Panel Discussions Address Nano and EUV

    Nanotechnology in Microlithography Panel Discussion: Self-Assembling Molecules for Semiconductor Patterning and Nanoelectronics

    Panel Moderators: Richard M. Silver, National Institute of Standards and Technology (United States) and Christopher L. Soles, NIST (United States)

    The evening panel discussion on nanotechnology in microlithography opened with comments by moderator Christopher Soles of NIST, who set the tone by contrasting "bottom-up" processes enjoy self-assembly (SA) with traditional "top-down" lithographic processes. Between these technologies, Soles explained, they absorb major differences - natural shapes vs conventional circuit design, local vs long-range order, monolayers vs tall aspect ratio features, CMOS vs emerging applications, intrinsic scaling limits vs nanoscale dimensions, wet, soft processes vs spotless elbowroom processes, leisurely ordering vs 100 wph, and the current pretty research pictures of SA vs staunch functional devices using lithography. He invited the panelists to discuss the near- and long-term prospects of SA and discuss the materials and metrology needs.

    Dan Herr of SRC then presented some of the challenges of directed self-assembly, including the needed shapes, throughput, and defects. He asserted that SA could very well subsist an augmenting technology to current processes rather than a competing technology.

    Greg Waldraff of IBM followed by presenting examples of electronic component self assembly on templated DNA biogrids, describing the faculty of DNA origami to create nanoscale devices.

    Lars Liebman, likewise of IBM, made a case for birth research now at the NSF level so that the technology is mature by 2016-2017, the time epoch Herr had predicted SA could subsist introduced into manufacturing. However, he cautioned that the community needs to subsist positive it is tackling the perquisite problem and not ignoring trimming or other issues.

    Joy Cheng of IBM joined her colleague, Dan Herr, in displaying recent toil in polymer self assembly, and Katy Bosworth predicted that the toil they are doing at Hitachi on arduous drive media could subsist one of the first to interlard screen copolymers into a lithographic process.

    Robert Brainard of Albany CNSE concluded the presentations by showing the relationship between chemically amplified resists, nanoimprint, and self assembly, asserting that each technology has stately strengths but will not subsist replacing each other. The panel then opened for debate and questions from the audience.

    BACUS Technical Group Panel Discussion: EUV Source $10M. EUV Scanner $100M. Defect Free EUV Photomask, Priceless! For some there's NIL, for everyone else, there's EUV.

    Panel Moderators: Bryan S. Kasprowicz, Photronics, Inc.; Franklin D. Kalk, Toppan Photomasks, Inc. Panel members (from left): Gilroy Vandentop, Bryan Rice, Anthony Yen, Oliver Kienzle, Tatsuhiko Higashiki, Paul Ackmann, Ben Eynon.

    Advanced Lithography opens to optimism, overflowing house

    A standing-room-only audience for the opening plenary session at SPIE Advanced Lithography in San Jose served as one more mark that the lithography industry is in a growth mode. Before the speakers from Nikon, Intel, and the venture capital arduous Silver Lake Partners took the stage, a prestigious optical microlithography award and five unusual Fellows of SPIE were announced.

    M. David Levenson, now associated with BetaSights, was named this year’s winner of the Frits Zernike Award for Advances in Optical Microlithography, for his toil in developing side shifting masks. The Frits Zernike Award is sponsored by Cymer and ASML.

    The five unusual Fellows from the lithography community -- Robert Allen, Jon Benschop, Clifford Henderson, Soichi Owa, and James Potzick -- are among a total of 62 unusual Fellows of SPIE elected this year. The unusual Fellows were honored with 20 other lithography Fellows at a luncheon later in the day.

    More awards followed the talks, including:

    C. grant Willson Best Paper award for 2009, to Richard Lawson, Laren Tolbert, and Clifford Henderson of Georgia Tech and Todd Younkin of Intel Corp.

    Jeffrey Byers Award for Best Poster Paper in Resist Materials and Processing Technology for 2009, to Xinyu Gu, Adam Berro, Younjin Cho, Kane Jen, Saul Lee, Tomoki Ngai, Toshiyuki Ogata, William Durand, and grant Willson of Univ. of Texas at Austin, Arunkumar Sundaresan, Jeffrey Lancaster, Steffen Jockusch, and Nicholas Turro of Columbia Univ., and Paul Zimmerman of Intel Corp.

    The Willson award is sponsored by AZ Electronic Materials and Rohm Haas Electronic Materials, and the Byers award is sponsored by Tokyo Electron.

    Three conferences opened sessions Monday morning, and two of several panel discussions scheduled for the week closed the day. Richard Silver and Christopher Soles of NIST moderated a panel on Self-Assembling Molecules for Semiconductor Pattering and Nanoelectronics. Bryan Kasprowicz of Photronics Inc. and Franklin Kalk of Toppan Photomasks moderated the BACUS panel on future potential technologies, including EUV, NIL, double patterning and direct wire.

    Plenaries Explore Past and Future of Lithographic Technologies

    The plenary session for the 35th year of this symposium got underway with three presentations exploring the past successes and future prospects of lithographic technologies.

    Kazuo Ushida of Nikon presented his predictions for lithography's future, promising not to bring wicked news, because as the Japanese proverb goes, "The priest who preaches foul dogma shall subsist reborn as a fungus." He predicted that although the next few years explore expedient for fab equipment, it's very unlikely that this industry will revert to its former levels. Current thought, said Ushida, is that double patterning will lift lithography from the 32 to the 22-nm node, and EUV will lift it from the 22 to the 16 nm node. However - what, he asked, if EUV comes too late?

    While the prospects of EUV are stately for advancing to the 22-nm node, Ushida declared that EUV silent has a long passage to proceed because 100x improvement is required in mask defectivity to achieve such feature reduction. Should development of the necessary mask infrastructure start today, he predicted, it would lift 2 years for tools to subsist available and another 2 years to fully understand defects before EUV could subsist a reality in 2014 - long after it would subsist needed for the 22-nm node. Because of this, one needs to explore at alternative means of achieving the 22-nm node.

    He presented three alternatives: spacer double patterning, pitch splitting double patterning, and line-cutting lithography, the last of which enables ArF extension to 16 nm. Because EUV is too far off to subsist practical, he said that 22 nm requires double patterning with immersion, which in spin will require tall overlay accuracy, CD uniformity, excellent throughput, low cost of ownership, lickety-split installation, and the possibility of reuse for next generations. He then presented Nikon's solution to barnone of these issues - the NSR-S620D - which has less than 2 nm overlay and 200 wph throughput and allows a modular approach to its construction enabling multigenerational use. Although 2010 and 2011 will subsist expedient years as the industry recovers, Ushida asserted that EUV challenges in mask infrastructure will dilatory its implementation until the 16-nm node.

    Eric Chen of Silver Lake Partners then gave an overview of the economics behind the lithography industry and voiced his concerns that without a change in global balances, the economy will never fully recover. However, he suggested that with a change in paradigms, there is stately market potential. The root causes, he said, of the worst global economic conditions in recorded economic history (the 2009 recession) were the ease of liquidity, the US real estate market bubble, and the widespread excess leverage.

    These created a juncture that is just now seemingly stabilizing, but they aren't out of the woods yet. The last 20 years has seen an unprecedented integration of global economies that absorb resulted in an imbalance in the world economy. Chen asserted that this model is broken, and without normalized growth in developing economies as well as the driving down of debt and consumption in developed countries, the economy will not rebalance.

    Chen reminded the audience that a recession in the tech sector was seen most recently in 2000-2001 when the equity bubble burst (as opposed to 2009's debt bubble). Unfortunately, debt bubbles are more stern and harder to recoup from. Two things drive economic growth - demographic changes and changes in productivity. Since productivity increases are driven by technology, Chen said, technology advances will likely deliver the day and drive unusual growth.

    Chen then reviewed a number of macro trends in technology. First off, he described the evolution of software into a service economy, such as the change from CDs and personal programs to iPhone apps and cloud computing driving mobile and telecom. He pointed out the increasing pace and scale of spotless technology, and then summarized the growing threat of Asia, noting its surge as an innovation leader as it moves from the inexpensive commercialization of technology to encompassing low-cost R & D on the leading cease as well.

    Sam Sivakumar of Intel then presented a talk that looked at the evolution of lithography as a play in four acts, starring the triumvirate of lithography, design, and process architecture.

    In Act I: The remote Past, Sivakumar considered the .25 micron and earlier technology and found that during that time period, lithography delivered design intent, but did not influence design or architecture. In Act II: The Recent Past (down to 65 nm), lithography then delivered design intent with some difficulty, such as in rule-based serif placement and hotspot determination. In present time, Act III (45-32 nm), lithography is now interacting closely with design and process architecture, profoundly influencing methodology in both areas.

    As for the future, he predicted (1) lithography will play a central role in defining design methodology and process architecture; (2) mask technology has become and will continue to subsist an integral portion of lithography planning for the next generation; and (3) managing the cost of patterning will subsist the real challenge in the near term. But lithography has become a full, equal colleague with design and process integration and the trait of their interaction will determine the industry's success or failure.

    Sculpteo, FICEP S3, ZiggZagg, and Multi Jet Fusion: HP Global Innovation summit Highlights Real-World 3D Printing Installations, Implications | real questions and Pass4sure dumps

    Beautiful Barcelona houses a charming intersection of gothic architecture, twentieth century art, and burgeoning twenty-first century technology. Serving as the site of last week’s insightful HP Global Innovation Summit, the city welcomed journalists and analysts from around the world to partake in two days of insights into the heart of disruptive technologies. 3D printing and immersive computing limn keys to the future of disruption — and to Industry 4.0. Never content to proceed along for the journey, global mainstay HP Inc. is working to secure a driver’s seat to this future, focusing on reinventing for this onward momentum.

    While the first day of the summit focused on HP and its approaches and offerings, the second day featured customer and colleague stories highlighting real-world implementation of 3D printing and immersive computing technologies. With rising global installations of Multi Jet Fusion (MJF) 3D printing technology, partners including the newly-opened International Advanced Manufacturing 3DHUB (IAM 3DHUB) serve as viable examples of additive manufacturing in employ today. During the summit, reports from France-based Sculpteo, Barcelona-based FICEP S3,  and Belgium-based ZiggZagg provided further first-hand experiences bringing MJF to the everyday of industry.

    A 3D printing panel opened the morning, as Vice President and common Manager of Multi Jet Fusion Ramon Pastor moderated a session including Sculpteo CEO and Co-Founder Clément Moreau, FICEP S3 Director Nuno Neves, and ZiggZagg CEO Stijn Paridaens.

    3D Printing Panel L-R: Paridaens, Neves, Moreau, Pastor

    “We started with 3D printing out of necessity, to design unusual machinery, innovative machinery; they had a lot of troubles getting optimal geometries by machining, so they adopted 3D printing,” Neves explained of his company’s approach to incorporating additive manufacturing. “Now they finish R&D in additive manufacturing for other companies, helping other companies bag to where they are now. We’ve been here eight years, and doing 3D printing for a year and a half — it was HP who introduced us to 3D printing.”

    ZiggZagg has been on the market now for about seven years, and started working with HP’s 3D printers about a year ago. The company went from one machine to six machines over the last twelve months, and Paridaens famed that they remark “a lot more to come; they remark a huge market opening up with this technology.”

    Sculpteo, which started with 3D printing for rapid prototyping, now incorporates the technology throughout its operations alongside other manufacturing technologies and uses 3D printing for mass production.

    “We are a manufacturing center, not that much a design center; their customers finish pretty much everything,” Moreau noted, showing a 3D printed helmet Sculpteo created using HP’s technology. “Multi Jet Fusion for this character of product is definitely the only expedient possibility that you have. This is a unusual character of product, a unusual character of geometry — you cannot gain this by injection molding.”

    Geometries, strength, and charge points were the major factors that each of the three kept returning to, as Neves famed that making one of their Da Vinci Paint Machines using MJF eliminates about 2,000 molds and that, effectively, the company’s investment into the industrial 3D printer was reutrned through the course of making just one machine.

    “I harmonize that charge is one of the reasons to adopt MJF,” Paridaens said. “We are planning to purchase an additional five printers by the cease of the year… They add some sort of a value to a portion that helps the customer that can only subsist produced by 3D printing… Really making now the strategy of mass customization and mass production, they remark a large market opening up… As of now, I believe customers are silent not ready if you proceed perquisite toward them, but if you absorb large concerns, large companies” employing the technology, adoption becomes more likely. “Also unusual materials coming up are one of the key factors why they decided to adopt this technology.”

    Trust, Pastor underscored, is “key to adoption” for unusual technologies. In many sectors, such as engineering, potential adopters are often risk-averse and prefer to remain to tried-and-true techniques in which they trained — even if that training was decades ago. Learning the intricacies of a unusual approach requires significant dedication, as, for example, design for additive manufacture (DfAM) represents a wholly unusual approach several from traditional design for machining or other subtractive technologies. Dedicating time, floorspace, and other resources to a unusual suite of technologies requires trust that the process will subsist worth it. Pastor asked the gathered executives about their thoughts on the key factors to unlock the market and accelerate adoption.

    “Company engineers are the key factor, they are the ones making the designs,” Paridaens said. “We remark in Belgium that education is now keeping up, kids in college are introduced to the technology. When they proceed to the customer, they say, ‘We absorb done it this passage for decades, let’s finish it this way.’ It’s a matter of trust. It needs to subsist proven.”

    Building on that response, Neves added, “People maintain designing parts the passage they’ve always done it… With MJF, what’s hardest is getting people to actually come, to remark the product, feel it with their hands. They cease up giving away a lot of samples… The key word is implementation… If you maintain doing things the passage you’ve been doing them, if you design as you’ve been designing, you won’t design anything new.”

    Neves famed as well that truly understanding the technology and its capabilities allows for informed design that enables the perquisite design the first time. While 3D printing famously speeds iteration and prototyping processes, understanding the control of dimensional precision — as well as how a portion will cool, and so compress or expand — allows for a speedier time to market for final parts production. DfAM requires significant attention and energy, but once through the learning curve, proves itself with a lickety-split ROI and ensuing profit, Neves added later when they sat down for a lengthier conversation.

    During the panel, Pastor asked Moreau, Neves, and Paridaens to “open your crystal balls for a explore into how you remark the future” and what challenges 3D technologies will absorb in unveiling this future.

    “3D printing, or additive manufacturing, really becomes a manufacturing technology for everyone,” Moreau began.

    “One key thing, they learn that education is key, design is key, software is likewise very notable — the passage you organize a factory software-wise is very important. An additive manufacturing factory is not just a factory with additive manufacturing; it’s something you requisite to wield very carefully. You cannot organize a short-run production factory in exactly the same passage you would organize a mass production factory. unusual software tools requisite to subsist involved and imlemented. In this way, I assume they can absorb additive manufacturing factories everywhere, in service bureaus as well as in customer hands.”

    Sculpteo, for its part, certainly understands the wide reach of 3D printing, as its global operations are up and running to serve a broad variety of customers with a variety of manufacturing technologies. Late last year, the company introduced its Fabpilot software, designed first for internal employ to connect operations at its Paris and San Francisco facilities, and broadened for customer employ to smooth workflows for 3D printing for production.

    Moreau discusses details a of a 3D printed helmet

    Neves underscored the weight of software, building on Moreau’s point. More accurate simulation is a specific requisite for the future of additive manufacturing, as current solutions “don’t always hold up.” As an example, he pointed to a portion from FICEP that breaks at a 20 kilogram load; “SOLIDWORKS says it should smash at 16 kg; on the one side this is good, it’s stronger than they think; on the other hand, they employ more material than they requisite to because of this.” Understanding the exact load capabilities is necessary for designing for the requisite strength of a given part, including the amount of material. Simulation is certainly in focus for many software companies in the 3D space, and Neves’ crystal ball reading on this front aligns well here.

    Looking more deeply into his crystal ball, Neves famed embedded electronics as a next gigantic thing for 3D printing. This development is held back not only by today’s additive manufacturing capabilities, but by industry standardization in the contour of a common connector for sensors.

    “This will subsist a lot of work, and everyone has to toil together,” he noted. “HP has to toil with its customers to basically evangelize this industry. Once they gain parts for a customer, they are a restate customer. This is quite nice. It’s getting this person, this company, to lift the responsibility, the ‘Yeah, I want to try this.'”

    Speaking as well to the future in a real questions mp;A with the gathered attendees, Moreau added that another trend Sculpteo is seeing comes in the contour of requested materials. supple and food- and skin-contact safe materials are at the top of the request list. FICEP and ZiggZagg finish most of their 3D printing toil in HP’s available materials, with PA 12 paramount for both at present. Future materials offerings hold stately interest to both of these companies, but PA 12 is expected to remain a mainstay even as additional, particularly more flexible, materials emerge.

    “What else I would enjoy to remark is metal, but that’s a different machine,” Neves said — and indeed, HP has announced its intent to proffer a metal 3D printing system.

    An tantalizing and notable issue that Paridaens raised as well was in response to a question in which it was suggested that additive manufacturing may lift the plot of traditional techniques.

    “It’s droll how you employ the word ‘replace.’ I don’t assume additive manufacturing will supersede traditional manufacturing — it will add to traditional manufacturing,” he said. “It’s not the holy grail. It’s something that can abet in a prototyping stage up to the production stage.”

    3D printing is, indeed, a manufacturing technology, not a magical reply (or, going back to the days of tall hype, a Replicator from the Enterprise). Recognizing the complementary nature of these technologies for industry is a key portion of the adoption and education process, and Paridaens’ underscoring this messaging in a discussion of real-world applications was a well-placed reminder that disruption doesn’t necessarily import full-on displacement.

    Following this panel discussion, immersive computing took seat stage with insights in real-world applications for personalized footwear.

    I likewise sat down for longer conversations with Paridaens and Neves later, including a visit to FICEP’s facility outside Barcelona, for additional insights into their implementation of 3D printing into their workflow and strategic approaches — remain tuned for these interviews and more from my whirlwind time in Barcelona.

    Discuss HP, Multi Jet Fusion, the future of manufacturing, and other 3D printing topics at or partake your thoughts in the Facebook comments below.

    [All photos: Sarah Goehrke]

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